In the semiconductor industry, dominated by the expensive EUV lithography technology, an alternative is emerging on the horizon. Japanese companies Canon and Dai Nippon Printing (DNP) are actively developing a nanoimprint method. They estimate it will enable the creation of chips with 1.4-nanometer features at significantly lower costs.

In the semiconductor industry, dominated by the expensive EUV lithography technology, an alternative is emerging on the horizon. Japanese companies Canon and Dai Nippon Printing (DNP) are actively developing a nanoimprint method. They estimate it will enable the creation of chips with 1.4-nanometer features at significantly lower costs.

  • Rekall Incorporated@piefed.socialOPEnglish
    2·
    2 days ago

    In the fall of 2024, the first samples of the equipment were sent to Intel for evaluation. Later, Samsung, TSMC, and other major market players also showed interest in the technology. DNP plans to start mass production of the necessary materials for 1.4nm chips in 2027. However, the established industry, entirely built around photolithography, could slow the adoption of the new technology. Switching to it would require manufacturers to significantly retool their existing production lines.

    Sounds like ecosystem/industry inertia will limit the adoption. Perhaps Japan’s Rapidus will try and leverage this tech as sort of high risk / high reward strategy to compete against TSMC.